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活化剂对Al-Cr扩散层中孔穴形成的影响 被引量:1

Influence of Activators on Formation of Voids in Aluminum-Chromium Diffusion Coatings
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摘要 Ni衬底用粉末包装法先扩散Al再扩散Cr时,在Al—Cr扩散层内产生了孔穴。它形成的原因是:活化剂NH4Cl加热分解时生成HCl气体,与已形成扩散层中的Al作用,使其从扩散层中逃逸,而在原来Al的位置上产生了孔穴。含有孔穴的Al-Cr扩散层的抗氧化能力明显降低。 Aluminum-chromium diffusion coatings on pure nickel substrate were formed by two-step pack cementation process. It was found that existed many voids in the coatings which were formed by first aluminizing and then chromizing. It could be understood that aluminum in the coatings reacted with HCL gas decomposed from activator NH4CL and formed ACL3,which evaporated and resulted in formation of the voids.Oxidation resistance of Al-Cr coating with these voids was reduced signigicantly.
出处 《北京科技大学学报》 EI CAS CSCD 北大核心 1996年第S2期42-45,共4页 Journal of University of Science and Technology Beijing
基金 冶金部腐蚀-磨蚀与表面技术开放研究实验室资助
关键词 卤化物活化剂 Al-Cr扩散层 孔穴 halide activator,Al-Cr diffusion coatings,voids
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  • 1褚虎儿,曹铁梁,石声泰.铬铝涂层及其抗高温腐蚀的行为[J]中国腐蚀与防护学报,1987(02). 被引量:1

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