摘要
采用微型多束电子束曝光手段研制微型、纳米卫星所用ＭＥＭＳ和ＡＳＩＭ分系统，具有灵活、迅速和设备费用较低的优点。本文介绍一台四束微型电子束曝光系统的总体方案、电子光柱计算、结构设计和扫描电路实验。四条电子束一条适用于微型机械直接光刻，两条适用于ＶＬＳＩ和ＭＭＩＣ，第四条适用于光集成电路。
The micro-multiple e-beams lithography system will offers a potential breakthrough for low-cos t, high-throughput manufacturing for MEMS and ASIM sub-sys tems of micro-nano satellites. This article will introduce the configurations, microcolumn,machnical design and scanning circuit of a four e-beams lithography system. The first and second beams are used to make VLSI and MMIC, the third beam is used to write directly micro-mechanical elements,the fourth beam-photo-integrated circuits.
出处
《仪器仪表学报》
EI
CAS
CSCD
北大核心
1996年第S1期310-313,共4页
Chinese Journal of Scientific Instrument
