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Preparation of GaN Powder of Nanometer Scale by MOCVD Using DEGA as Precursor

Preparation of GaN Powder of Nanometer Scale by MOCVD Using DEGA as Precursor
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摘要 GaN powder of nanometer scale was prepared by metal organic chemical vapor deposition using diethylgallium azide as precursor. The resulting powder was characterized by XRD and TEM. It has been found that the particle size of the powder obtained is affected by the deposition temperature, and the fine crystals formed in temperature range 500 similar to 650 degrees C were hexagonal. GaN powder of nanometer scale was prepared by metal organic chemical vapor deposition using diethylgallium azide as precursor. The resulting powder was characterized by XRD and TEM. It has been found that the particle size of the powder obtained is affected by the deposition temperature, and the fine crystals formed in temperature range 500 similar to 650 degrees C were hexagonal.
出处 《Chinese Chemical Letters》 SCIE CAS CSCD 1997年第2期185-188,共4页 中国化学快报(英文版)
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