摘要
ＥＦＦＥＣＴＯＦＢＯＲＯＮＯＮＭＩＣＲＯＳＴＲＵＣＴＵＲＥＡＮＤＰＲＯＰＥＲＴＩＥＳＯＦＴｉＮＦＩＬＭ①ＹａｎｇＱｉａｏｑｉｎ，ＺｈａｏＬｉｈｕａ，ＸｉａｏＨａｎｎｉｎｇＭａｔｅｒｉａｌＴｅｓｔａｎｄＲｅｓｅａｒｃｈＣｅｎｔｅｒ，ＨｕｎａｎＵｎｉｖ...
By adding boron to the Ti N film, a nanocrystalline multiphase composite Ti B N film was deposited using activation ion plating under different negative bias voltages. It is found that the mechnical properties of the Ti B N film are much better than that of the Ti N film. Diffraction measurements show that the composite film consists mainly of TiN with dispersed TiB, cubic BN and Ti B N phases. SEM and TEM micrographs indicate that the Ti B N film has a dense fine nanocrystalline structure and also a dense close interfacial bonding of the film to substrate. The results of AES and EPMA show that a diffusion zone exists at the film/ substrate interface and the higher the negative bias voltage, the wider the diffusion zone.
出处
《中国有色金属学会会刊：英文版》
EI
CSCD
1997年第4期98-102,共5页
Transactions of Nonferrous Metals Society of China
