摘要
To obtain microstructure of magnetic devices, the thin film inductors were fabricated by the process such as thin film manufacturing, photolithography and wet etching. The frequency characteristics of these devices are measured at high frequency range. When the inductor sizes of the spiral and the meander type are same, the inductance and the quality factor of the spiral type inductor are larger than those of the meander type inductor, but the driving frequency of the spiral type inductor is lower than that of the meander type inductor.
To obtain microstructure of magnetic devices, the thin film inductors were fabricated by the process such as thin film manufacturing, photolithography and wet etching. The frequency characteristics of these devices are measured at high frequency range. When the inductor sizes of the spiral and the meander type are same, the inductance and the quality factor of the spiral type inductor are larger than those of the meander type inductor, but the driving frequency of the spiral type inductor is lower than that of the meander type inductor.
作者
T.S. Yoont, W.S. Cio and C. O.Kim (Division of Material Eng., Chungnam Nail. Unly., Taejon 305-764, Korea) H. w. hag (Dept. of Electronic Communication, Juseong College, Chungbuk 363-794, Korea) Y.H.Kim (Dept. of Electrical Eng., Pukyong Nail. Unly., Pusan, 608-737, Korea)
基金
Korea Research Foundation!1996.
