摘要
激光技术的发展对减反膜提出了超高透过率的要求,基板的表面特征在高精度减反膜的设计与制造中不可忽略。选择熔融石英为基板,Ta2O5和SiO2为高低折射率膜层材料,针对在0°入射角下工作的532 nm激光减反膜进行设计与分析,得到膜层内的电场分布。在模拟计算中将基板的表面粗糙度等效为等比例混合膜,计算分析了理想设计条件下不同厚度界面层的V型减反膜,得到透过率与界面粗糙度的数值函数关系,最后利用数值优化的方法对理想设计进行修正,得到了存在界面层的减反膜修正结果,研究结果有助于实现超高透过率短波长激光减反膜的设计与制备。
With the development of laser technology, there is a requirement of the antireflection coating with ultra-high transmittance. It is crucial to consider the influence of the surface characteristics of substrates during the design, manufacture of high precision antireflection coating. In this paper, the substrate was fused silica and Ta2O5 and SiO2 were selected as high index and low index materials respectively. The 532 nm laser antireflection coating at normal incidence was designed, and the electric field distribution was calculated, while the surface roughness was considered as a mixed layer of geometric proportion volume. Then, the ideal V-type antireflection coating with interface layers of different thickness was calculated, and the numerical function relationship between the transmittance and the interface roughness was founded. At last the ideal design was optimized by numerical method, and the thin film structures with interface layer were gained. Research result is helpful to designing and preparing for the antireflection coating at short wavelength with ultra high transmittance.
出处
《红外与激光工程》
EI
CSCD
北大核心
2011年第10期2003-2007,2027,共6页
Infrared and Laser Engineering
基金
天津市科委项目(10JCYBJC01500)
关键词
激光减反膜
界面层
表面粗糙度
修正设计
antireflection coating
interface layer
surface roughness
modified design
