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Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon 被引量:12

Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon
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摘要 Various methods for production of polysilicon have been proposed for lowering the production cost andenergy consumption, and enhancing productivity, which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones, but the homogeneous reaction of silane in FBCVD results in unwanted formation of fines, which will affect the product qualityand output. There are some other problems, such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of challenges to tackle and principles should be followed in the design ofa FBCVD reactor. 为多晶硅的生产的各种各样的方法为降低生产费用和精力消费被建议了,并且提高生产率,它为工业应用程序是批评的。使流体化的床化学药品蒸汽免职(FBCVD ) 方法是常规的,而是在在罚款的讨厌的形成的 FBCVD 结果的 silane 的同类的反应的一种很有希望的选择,它将影响产品质量和产量。有一些另外的问题,例如加热由于反应堆和加热器的墙上的不希望得到的多晶硅免职的退化。这篇文章主要为解决上述问题在多晶的硅和研究地位的 FBCVD 上考察工艺的发展。它也鉴别对处理和原则的很多挑战应该在一个 FBCVD 反应堆的设计被跟随。
出处 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2011年第5期747-753,共7页 中国化学工程学报(英文版)
基金 Supported by the Natural Science Foundation of Shandong Province of China (ZR2009BM011) and the Doctor Foundation of Shandong Province of China (BS2010NJ005).
关键词 fluidized bed chemical vapor deposition fine particles homogeneous reaction 化学气相沉积法 多晶硅 流化床 硅技术 生产成本 工业应用 均相反应 反应堆
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