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DESIGN EFFICIENCY FOR MINIMUM PROJECTION UNIFORMITY DESIGNS WITH TWO LEVELS 被引量:3

DESIGN EFFICIENCY FOR MINIMUM PROJECTION UNIFORMITY DESIGNS WITH TWO LEVELS
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摘要 The objective of this paper is to study the issue of design efficiency for minimum projection uniformity designs. The results show that for orthogonal arrays with strength two, the minimum projection uniformity criterion is a good surrogate for the design efficiency criterion proposed by Cheng, Deng and Tang (2002).
出处 《Journal of Systems Science & Complexity》 SCIE EI CSCD 2011年第4期761-768,共8页 系统科学与复杂性学报(英文版)
基金 supported bythe National Natural Science Foundation of China under Grant No.10671080 NCET under Grant No.06-672 SRFDP under Grant No.20090144110002 the Innovation Program Funded by Central China Normal University
关键词 Generalized minimum aberration minimum projection uniformity orthogonal array uniform design. 设计效率 均匀设计 投影 正交阵列 均匀性 标准
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  • 1Chang-Xing Ma,Kai-Tai Fang.A note on generalized aberration in factorial designs[J].Metrika.2001(1) 被引量:1

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