摘要
测量了正电子在化学沉积的非晶态Ni-P合金镀层中的透射强度,借此求得正电子在该镀层中的有效质量吸收系数和注入剖面。研究了磷含量和热处理对化学沉积和电沉积的非晶态Ni-P合金结构缺陷的影响。
The positron transmitted intensity, effective mass absorption coefficient and implantation profile in electroless deposits of amorphous Ni-P(25at.%) alloy on annealed pure Cu substrate were determined and calculated. The effects of P content in alloy and thermal treatment on struc ture of deposited amorphous Ni-P alloys were also studied.
出处
《厦门大学学报（自然科学版）》
CAS
CSCD
北大核心
1990年第5期538-541,共4页
Journal of Xiamen University：Natural Science
基金
国家自然科学基金
关键词
非晶态
合金
镀层
正电子
NI-P
Amorphous, Ni-P alloy, Eleciroless deposits. Positron. Implantation profile, Defect
