摘要
采用直流磁控溅射方法在不同工作气压下制备了Bi薄膜,对薄膜的晶体结构、沉积速率、表面形貌和生长模式进行了研究,并对其晶粒尺寸的变化规律进行了分析。X射线衍射(XRD)结果表明Bi薄膜均为多晶斜六方结构。研究发现沉积速率随工作气压的升高先增大后减小。扫描电镜(SEM)图像显示随着工作气压的升高,小晶粒尺寸增大、大尺寸晶粒逐渐消失,薄膜变得疏松多孔;薄膜经历柱状-节榴状-楔形3种生长方式。
Bi films were fabricated at different work pressure by DC magnetron sputtering. The crystal structure, deposition rate, surface topography and growth model of Bi films as the function of work pressure were studied. The effect of work pressure on grain size of Bi films was discussed. The results of XRD show that all Bi films deposited at different work pressures are polycrystalline of hexagonal. It is found that with the increasement of work pressure the deposition rate raises firstly, then decreases. The images of SEM indicate that the size of small grains increases with the increasement of work pressure but the big size grains vanish gradually and the films become to porous. The images also show that with the increasement of work pressure, the shape of the films changes from columnar to burl, then to cuni form.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2011年第4期38-40,61,共4页
Surface Technology
基金
西华师范大学大学生科技创新基金项目(42710071)
关键词
直流磁控溅射
Bi薄膜
工作气压
沉积速率
表面形貌
DC magnetron sputtering
Bi films
work pressure
deposition rate
surface topography
