摘要
介绍了制备GZO薄膜的各种方法,如磁控溅射法、化学气相沉积法、溶胶-凝胶法、脉冲激光沉积法、喷雾热解法;阐述了这些方法的镀膜原理,并比较了各种工艺的优缺点。综述了GZO薄膜在单层膜领域、复合多层膜领域有机物基底上镀膜领域和薄膜后续退火处理领域的研究现状。提出了产业化过程中需要解决的问题:①制备高密度、高溅射稳定性和导电性优良的靶材;②完善现有镀膜工艺条件;③制备符合不同生产要求的薄膜。
Various preparation methods of GZO thin films： magnetron sputtering, chemical vapor deposition, sol-gel method, pulsed laser deposition, spray pyrolysis are introduced, the principle of these methods is described, and advantages and disadvantages of these various technologies are compared. Current research situation of the GZO films is discussed in the field of single-layer film, multilayer composite fields, the field of organic substrate coating, and the field of follow-up status of annealing. The problem of industrialization raised should be solved： ① Prepare high density, high stability and excellent conductivity of sputtering targets; ② Improve the existing coating process conditions; ③Prepare the films that meet different production requirements.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2011年第7期17-23,共7页
Materials Reports
基金
国家自然科学基金(50474077)
关键词
GZO薄膜
透明导电氧化物
制备方法
电阻率
可见光透过率
GZO thin film, transparent conductive oxides, fabrication methods, resistivity, visible light trans- mittance
