摘要
为了提高单个靶件的铀装载量,简化制备工艺,将目前广泛用于制备α核素靶的电沉积方法用于铀靶的制备。研究了在水溶液体系中电沉积制备铀靶的方法,以0.15 mol/L草酸铵为电沉积液,研究了不锈钢基层处理工艺、电流密度、酸度、温度、镀液中铀离子浓度等对电沉积层质量的影响,确定了电沉积法制备铀靶的工艺参数,运用扫描电子显微镜、X射线能谱和红外光谱对电沉积层的表面形貌、微区成分和结构组成进行分析和表征。控制镀液中UO2(NO3)2的量,调节镀液pH至2~3,电流密度60 mA/cm2,通入60℃恒温水,保持(NH4)2C2O4的质量浓度在4~6 mg/mL2,即可获得6 mg/cm2的电沉积层,分光光度法测其电沉积效率>98%,厚度约6 mg/cm2。
In order to increase the amount of uranium target,simplify preparation process,electrodeposition method that widely used for preparation of α nuclides target was used for preparation of uranium target.Preparation method of electro-deposition uranium targets was researched.Taking 0.15mol/L ammonium oxalate as electrodeposion solution,the effect of base teatment process of stainless steel,current density,acidity,temperature,uranium ion concentration in plating solution on quality of electrodeposited layer was studied.The process parameters of preparation of uranium targets by electrodeposition were defined.The surface morphology,micro-zone component and structure of electrodeposited layer were analyzed and charactertized by infrared-ray spectrum,scanning electron microscope,and X-ray spectrum.The thickness of the uranium layers can reach 6 mg/cm2 by controlling the content of UO2（NO3）2 in plaitng solution,at 60 mA/cm2,pH at 2～3,temperature at 60 ℃,and（NH4）2C2O4 quality concentration at 4~6 mg/mL.The spectrophotometry showed the electro-deposition layer was thin and adherent films with a yield near 98%.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2010年第6期80-83,共4页
Surface Technology
基金
中国工程物理研究院重点预研基金资助项目(4210507)
关键词
电沉积
铀
靶
electro-deposition
Uranium
target
