摘要
为研究环境温度对含氢无定形碳(a-C:H)膜结构和性能的影响,将a-C:H膜在大气环境中进行高温退火处理,并借助红外光谱、拉曼光谱、X射线光电子能谱、3D表面分析仪和球盘摩擦试验机等手段对退火前后a-C:H膜的结构、组成和性能进行了系统地考察.研究发现,在较低的退火温度下(300℃),a-C:H膜结构无明显变化,而其内应力降低,摩擦学性能显著提高;在400℃和500℃下退火,膜结构发生明显变化并伴随严重氧化,同时摩擦学性能降低甚至完全失效.结果表明,退火温度的选择对a-C:H膜的结构、组成及性能具有重要影响.
Hydrogenated amorphous carbon（a-C：H） films were annealed in air,to investigate the effect of ambient temperature on the structure and properties of a-C：H films.After annealed at different temperatures,structure,composition and properties of a-C：H films were investigated via Fourier transform infrared spectroscopy（FTIR）,Raman spectroscope,X-ray photoelectron spectroscope（XPS）,3D surface profiler and ball-on-disk tribotester.Compared with the as-deposited film,the a-C：H film annealed at low temperature of 300℃ exhibits similar struc-ture,with internal decreasing stress and notably improved tribological property.Comparatively,at elevated tem-peratures of 400℃ and 500℃,the annealed films present severe graphitization and oxidation,contributing to the deterioration of the tribological properties or even complete failure.Thus,the annealing temperature plays a sig-nificant role on the structure,composition and properties of a-C：H films.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2011年第2期209-213,共5页
Journal of Inorganic Materials
基金
国家自然科学基金(50705093)
中国科学院创新群体基金(50421502)~~
关键词
a-C:H膜
退火温度
结构
摩擦学性能
a-C：H film
annealing temperature
structure
tribological property
