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射频磁控溅射法沉积透明柔性导电CdO薄膜 被引量:1

Flexible and Transparent Conducting CdO Films Deposited by RF Magnetron Sputtering
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摘要 随着透明电子器件和柔性显示器的发展,柔性透明导电薄膜正在受到越来越多的关注。采用射频磁控溅射法在柔性衬底上低温沉积高透过率、低电阻率的CdO薄膜。研究了O2流量对薄膜的结晶性能、光学性质和导电性能的影响。研究结果表明,室温下沉积的CdO薄膜均为结晶性能良好的立方结构薄膜,(200)取向性明显。另一方面,O2流量对CdO薄膜的光电性能有很大的影响。O2流量过小时,薄膜的透光率较差,而当O2流量较大时,薄膜的电阻率较大,当O2流量大于3 cm3/min时,光学透光率不再有大的变化。 With the development of transparent electronic devices and flexible displays,the flexible and transparent conducting films have been attracted more and more attention.CdO thin films with high transmittance and low electrical resistance were prepared on flexible organic films by RF magnetron sputtering.The effect of the oxygen flow rate on the crystalline structure,optical property and electrical conductivity of the thin films was studied.Experimental results show that the CdO thin films deposited at room temperature have high crystalline quality and growing in a preferential(200)orientation.The oxygen flow rate has much influence on the optical transmittance and the electrical resistivity of the CdO films.The larger the flow rate of O2,the higher the electrical resisitivity of the CdO films,while the optical transmittance does not change too much when the flow rate of O2 is greater than 3 m3/min.
出处 《半导体技术》 CAS CSCD 北大核心 2010年第12期1170-1173,共4页 Semiconductor Technology
基金 国家自然科学基金(60576063) 浙江省科技计划(2008F70015 2009C31007)
关键词 氧化镉 薄膜 射频磁控溅射 方块电阻 电阻率 CdO thin film RF magnetron sputtering square resistance resistivity
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参考文献12

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