摘要
建立的平行平板流动腔装置适用于研究血管内皮细胞代谢对剪切流场的响应。将培养的人胚肾小球血管单层内皮细胞置于剪应力分别为５×１０－５Ｎ／ｃｍ２，１×１０－４Ｎ／ｃｍ２和１．５×１０－４Ｎ／ｃｍ２的定常层流中剪切２５小时，样品中的内皮素分泌量用放射免疫法测定。结果表明，剪应力水平对内皮细胞内皮素的代谢活动有显著影响。与静态培养对照，低水平的剪应力（５×１０－５Ｎ／ｃｍ２、１×１０－４Ｎ／ｃｍ２）促进内皮素的分泌，而较高水平的剪应力（１．５×１０－４Ｎ／ｃｍ２）抑制内皮素的分泌；
A new parallel plate flow chamber apparatus has been established for the study of metabolic response of endothelial cells to a wide range of well-controlled steady and pulsatile shear stresses for long time periods. Cultured,replicate human glomerulus vascular endothelial cell monolayers were exposed to steady laminar shear stresses of 5×10-5 N/cm2,1×10-4 N/cm2 and 1.5×10-4 N/cm2 or in a stationary incubation for up to 25 hours, and the production rate and the cumulative production of endothelin were determined by radioimmunoassay. The results demonstrated that levels of shear stress affected significantly the metabolism of endothelin in HGVEC. Compared with the stationary incubation,exposure to such low levels of shear stresses as 5×10-5N/cm2 and 1×10-4N/cm2 may actually increase secretion of endothelin and that a higher level of wall shear stress of 1.5×10-4N/cm2 decreases the secretion. Effect of shear stress on the cumulative production of endothelin was greater than on the production rate of endothelin.
出处
《生物物理学报》
CAS
CSCD
北大核心
1999年第1期178-185,共8页
Acta Biophysica Sinica
基金
国家自然科学基金
关键词
剪切应力
血管内皮细胞
内皮素
细胞代谢
Shear stress Vascular endothelial cell Endothelin Cellular metabolism Flow chamber apparatus
