摘要
采用热蒸发方法在玻璃基片上沉积100 nm以内不同厚度的铜薄膜.利用X射线衍射仪、原子力显微镜和分光光度计分别检测薄膜的结构、表面形貌和光学性质,用Van der Pauw方法测量薄膜的电学性质.结果表明,可以将薄膜按厚度划分为区（0-11.5 nm）的岛状膜、区（11.5-32 nm）的网状膜和区（〉32.0 nm）的连续膜.薄膜的表面粗糙度随膜厚的增加,在、区时增加,区时减小.薄膜电阻在区时无法测量,在区随膜厚的增加急剧下降,而在区时随膜厚增加缓慢减小.薄膜的光学吸收与其表面粗糙度密切相关,其变化规律与表面粗糙度的变化相一致.
Cu films with different thicknesses（d,d〈100 nm） were deposited on glass substrates by thermal evaporation.The structure,surface morphology,optical and electrical properties of the films were investigated by X-ray diffractometer,atomic force microscopy and Van der Pauw method,respectively.The films can be divided into three regions,which are island,mesh and continuous film.The thicknesses of three regions are between 0 and 11.5 nm,between 11.5 and 32.0 nm and larger than 32.0 nm respectively.In the first region,the resistance of film is too big to be detected.The resistivity sharp decreases in the second region and slowly decreases in the third region as the thickness increases.The variation of the optical absorption of the films with the change of thickness is consistent with the change of surface roughness.The optical absorption has a close relationship with surface roughness.
出处
《福建师范大学学报（自然科学版）》
CAS
CSCD
北大核心
2010年第6期49-53,共5页
Journal of Fujian Normal University：Natural Science Edition
基金
福建省自然科学基金资助项目(2007J0317)
福建省教育厅资助项目(JA08048)
关键词
铜薄膜
膜厚
结构
光学性质
电学性质
Cu films
film thickness
structure
optical properties
electrical properties
