期刊文献+

Microstructure and Ferroelectric Properties of (Bi_(0.9)Ho_(0.1))_(3.999)Ti_(2.997)V_(0.003)O_(12) Thin Films Prepared by Sol-gel Method for Nonvolatile Memory

Microstructure and Ferroelectric Properties of (Bi_(0.9)Ho_(0.1))_(3.999)Ti_(2.997)V_(0.003)O_(12) Thin Films Prepared by Sol-gel Method for Nonvolatile Memory
原文传递
导出
摘要 The (Bi0.9Ho0.1)3.999Ti2.997V0.003012 (BHTV) films have been prepared on Pt/Ti/SiO2/Si substrates by solgel method. The microstructure and ferroelectric properties of the BHTV films were investigated. The BHTV films show a single phase of Bi-layered Aurivillius structure and dense microstructure. The Ho3+/V5+ cosubstitution can effectively improve the ferroelectric properties. The BHTV film exhibits good ferroelectric properties with 2Pr of 47.6℃/cm2, 2Ec of 265 kV/cm (at applied field of 420 kV/cm), dielectric constant of 305, dielectric loss of 0.031 (at 1 MHz), good insulting behavior, as well as the fatigue-free behavior. The (Bi0.9Ho0.1)3.999Ti2.997V0.003012 (BHTV) films have been prepared on Pt/Ti/SiO2/Si substrates by solgel method. The microstructure and ferroelectric properties of the BHTV films were investigated. The BHTV films show a single phase of Bi-layered Aurivillius structure and dense microstructure. The Ho3+/V5+ cosubstitution can effectively improve the ferroelectric properties. The BHTV film exhibits good ferroelectric properties with 2Pr of 47.6℃/cm2, 2Ec of 265 kV/cm (at applied field of 420 kV/cm), dielectric constant of 305, dielectric loss of 0.031 (at 1 MHz), good insulting behavior, as well as the fatigue-free behavior.
出处 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2010年第8期679-681,共3页 材料科学技术(英文版)
基金 supported by the Young Scientists Fund of the National Natural Science Foundation of China under grant No.50902108
关键词 (Bi0.9Ho0.1)3.999Ti2.997V0.003O12 thin films Sol-gel method Co-substitution Ferroelectric properties Dielectric properties (Bi0.9Ho0.1)3.999Ti2.997V0.003O12 thin films Sol-gel method Co-substitution Ferroelectric properties Dielectric properties
  • 相关文献

参考文献23

  • 1J.F. Scott and C.A. Araujo: Science, 1989, 246, 1400. 被引量:1
  • 2B.H. Park, B.S. Kang, S.D. Bu, T.W. Noh, J. Lee and W. Jo: Nature, 1999, 401, 682. 被引量:1
  • 3J. Scott: Science, 2007, 315, 954. 被引量:1
  • 4P. Fang, C. Robbins and B. Aurivillius: Phys. Rev., 1962, 126, 892. 被引量:1
  • 5E. Subbarao: Phys. Rev., 1961, 122, 804. 被引量:1
  • 6P. Joshi and S. Krupanidhi: Appl. Phys. Lett., 1993, 62, 1928. 被引量:1
  • 7X. Wu, X. Lu, A. Chen, Y. Yin, J. Ma, W. Li, Y. Kan, D. Qian and J. Zhu: Appl. Phys. Lett., 2005, 86, 092904. 被引量:1
  • 8D.Y. Guo, M.Y. Li, J. Liu, L.J. Fu, J. Wang, B.F. Yu and B. Yang: Mater. Sci. Eng. B, 2007, 142, 135. 被引量:1
  • 9S. Kim, C. Moriyoshi, S. Kimura, Y. Kuroiwa, K. Kato, M. Takata, Y. Noguchi and M. Miyayama: AppL Phys. Lett., 2007, 91, 062913. 被引量:1
  • 10U. Chon, H. Jang and M. Kim: Phys. Rev. Lett., 2002, 89, 087601. 被引量:1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部