摘要
本文研究了高氯酸/乙醇抛光液体系在15V安全电压下高纯铝的抛光工艺以及抛光过程的电流密度,并对"暗色膜"现象进行了解释,对抛光电极间距、操作温度对抛光效果的影响进行探讨,得出最佳抛光工艺:电极间距7～8cm,操作温度10～15℃,电流密度0.7～0.8A/m^2,抛光时间3min。
A kind of electrochemical polishing technics for high pure aluminum film is studied in the polishing system of the HClO_4/C_2H_5OH under voltage of 15 V. The variation of current density and the appearence of ＂dark film＂ during polishing process are investigated. The influence of distance between electrodes and polishing temperature on polishing quality is also discussed in this paper. The optimum technical parameters are obtained as follows： distance between electrodes of 0.7～0.8 cm, polishing temperature of 10～15 ℃, current density of 0.7～0.8 A/m^2 and polishing time of 3 min.
基金
国家自然科学基金(20401001
50772001)
安徽省优秀青年科技基金(08040106822)
关键词
电化学
电化学抛光
高纯铝
暗色膜
electrochemistry
electrochemical polishing
high pure aluminum
dark film
