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Microstructure and strain analysis of GaN epitaxial films using in-plane grazing incidence x-ray diffraction 被引量:1

Microstructure and strain analysis of GaN epitaxial films using in-plane grazing incidence x-ray diffraction
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摘要 This paper investigates the major structural parameters, such as crystal quality and strain state of (001)-oriented GaN thin films grown on sapphire substrates by metalorganic chemical vapour deposition, using an in-plane grazing incidence x-ray diffraction technique. The results are analysed and compared with a complementary out-of-plane x- ray diffraction technique. The twist of the GaN mosaic structure is determined through the direct grazing incidence t of (100) reflection which agrees well with the result obtained by extrapolation method. The method for directly determining the in-plane lattice parameters of the GaN layers is also presented. Combined with the biaxial strain model, it derives the lattice parameters corresponding to fully relaxed GaN films. The GaN epilayers show an increasing residual compressive stress with increasing layer thickness when the two dimensional growth stage is established, reaching to a maximum level of-0.89 GPa. This paper investigates the major structural parameters, such as crystal quality and strain state of (001)-oriented GaN thin films grown on sapphire substrates by metalorganic chemical vapour deposition, using an in-plane grazing incidence x-ray diffraction technique. The results are analysed and compared with a complementary out-of-plane x- ray diffraction technique. The twist of the GaN mosaic structure is determined through the direct grazing incidence t of (100) reflection which agrees well with the result obtained by extrapolation method. The method for directly determining the in-plane lattice parameters of the GaN layers is also presented. Combined with the biaxial strain model, it derives the lattice parameters corresponding to fully relaxed GaN films. The GaN epilayers show an increasing residual compressive stress with increasing layer thickness when the two dimensional growth stage is established, reaching to a maximum level of-0.89 GPa.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第7期471-478,共8页 中国物理B(英文版)
基金 supported by the National Natural Science Foundation of China (Grant Nos. 60506001,60776047,60976045 and 60836003) the National Basic Research Programme of China (Grant No. 2007CB936700) the National Science Foundation for Distinguished Young Scholars,China (Grant No. 60925017)
关键词 in-plane grazing incidence x-ray diffraction gallium nitride mosaic structure biaxialstrain in-plane grazing incidence x-ray diffraction, gallium nitride, mosaic structure, biaxialstrain
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