摘要
本文建立ＩＣ光刻工艺相关缺陷计算模型和基于ＭｏｎｔｅＣａｒｌｏ统计成品率计算模型．阐述了集成电路功能成品率仿真系统ＸＤＹＥＳ实现，讨论了应用ＸＤＹＥＳ实现功能成品率设计，并给出该系统实用性验证．研究分析表明，其结果与实际结果符合很好．
In this paper,the defect and yield computational models associated with IC lithography process have been built by Monte Carlo statistical method.A realizable system of IC functional yield simulator,XD YES,and an approach of yield design are obtained.The applications of XD YES have shown that the calculated results agree with the practical ones.
出处
《电子学报》
EI
CAS
CSCD
北大核心
1999年第2期55-58,共4页
Acta Electronica Sinica
基金
国家科技攻关96738项目资助
关键词
功能成品率
预测
仿真
VLSI
VLSI,Functional yield,Prediction and simulation
