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氧化锆基台研制及其与种植体连接界面适合性研究 被引量:9

The development of zirconia abutments and evaluation of the fitness of abutment-implant interface
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摘要 目的研制氧化锆基台并评价其与种植体连接界面的适合性。方法2007年5月至2009年1月在青岛大学医学院附属医院口腔科选用纳米氧化锆粉,采用冷等静压成型方法和二次烧结工艺制作氧化锆基台,选取15枚氧化锆基台与0sstemUSⅡ种植体装配,应用扫描电镜测量基台与种植体连接界面微间隙。结果研制的氧化锆基台与种植体装配顺利,基台与种植体连接界面的边缘微间隙为(3.17±0.34)μm、内部微间隙为(28.4±2.7)μm。结论采用纳米氧化锆粉经冷等静压成型和二次烧结工艺制作的基台与种植体有较好的适合性。 Objiective To develope a new method of manufacturing zirconia abutments and assess the fitness of abutment-implant interface. Methods The zirconia abutments were made from nano zirconia powder by cold isostatic pressing and two-step sintering. Fifteen zirconia abutments were chosen and fixed to Osstem US Ⅱ System implants, then the microgaps at abutment-implant interface were measured by scanning electron microscope. Results No difficulties were encountered in manufacturing zirconia abutments . The average width of the marginal microgaps was (3.17±0.34)microns;the width of internal microgaps at the abutment-implant interface was(28.4±2.7)microns. Conclusion The abutments made from nano zireonia powder using cold isostatic pressing and two-step sintering have good fitness with implants.
出处 《中国实用口腔科杂志》 CAS 2010年第1期30-32,共3页 Chinese Journal of Practical Stomatology
基金 青岛市科技计划项目(08-2-1-nsh)
关键词 氧化锆基台 冷等静压成型 二次烧结 基台与种植体连接界面 微间隙 适合性 zireonia abutments cold isostatic pressing two-step sintering abutment-implant interface mierogap fitness
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