摘要
对于有口径、阵元数和最小阵元间距约束的直线阵列天线,运用改进的遗传算法通过调整单元的位置来同时优化其辐射和散射特性。并用矩量法验证了论文算例经优化后,完全计入互耦的辐射方向图峰值副瓣电平在-18.5dB以下,且在绝大部分角域处于低散射状态,表明论文方法能指导兼顾辐射和散射特性的多约束阵列天线设计。
Considering a linear array with the constraints of array aperture, the number of elements and minimum element spacing, an improved genetic algorithm （IGA） is presented and used for optimizing both the radiation and scattering characteristics of it by adjusting the element placement. Compared with the uniform array, the proposed method makes the nonuniform array produce lower peak side lobe level （PSLL） and be at the status that it scatters with low level for most incident angles. The simulated results validating the accuracy of this method are presented.
出处
《电波科学学报》
EI
CSCD
北大核心
2009年第6期1044-1048,共5页
Chinese Journal of Radio Science
基金
国防预研项目
关键词
遗传算法
矩量法
副瓣抑制
雷达散射截面减缩
genetic algorithm
method of moment （MoM）
sidelobe suppression
radar cross section reduction （RCSR）
