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考虑工艺波动的RLC互连延时统计模型

RLC model of interconnect delay with process variations
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摘要 基于概率解释算法的原理,提出了一种考虑工艺波动的RLC互连延时统计模型,该模型使用了对数正态分布函数。在给定互连参数波动范围条件下,利用该算法计算延时仅需要采用前两个瞬态。和HSPICE相比,Monte Carlo分析中的均值和平均偏差误差分别低于0.7%和0.51%。模型计算简单且精度高,可以满足互连线仿真要求。 Based on the theory of the probability interpretation algorithm, a statistical model of RLC interconnect delay in the presence of process variations was put forward. This model adopted the Lognormal Distribution Function. By this arithmetic, only the first two moments were needed to estimate the interconnect delay. Compared with HSPICE, the average errors of the mean and average deviation in Monte Carlo analysis were less than 0.7% and 0.51% respectively. The model of this paper is of simple calculation and high precision, which can satisfy the requirement of interconnect simulation.
出处 《信息与电子工程》 2009年第6期584-588,共5页 information and electronic engineering
关键词 工艺波动 互连延时 统计模型 RLC电路 对数正态分布 process variation interconnect delay statistical model RLC Lognormal Distribution
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参考文献6

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