期刊文献+

Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering 被引量:2

Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering
原文传递
导出
摘要 Transparent conducting molybdenum-doped zinc oxide (MZO) films were successfully prepared by radio frequency (RF) magnetron sputtering method on glass substrates under different substrate temperatures. The nature of MZO film is polycrystalline with hexagonal structure and a preferred orientation along c-axis. With increasing substrate temperature from room temperature to 400℃, the crystallinity of the films is deteriorated and the resistivity increases sharply due to both the decrease of carrier concentration and Hall mobility. The lowest resistivity achieved is 9.2×10^-4 Ω· cm with a high Hall mobility of 30 cm^2·V^-1·s^-1 for the film deposited at room temperature. The average transmttance in the visible range exceeds 85% for all the samples. The optical band gap decreases from 3.30 to 3.25 eV with substrate temperature from room temperature to 400℃. Transparent conducting molybdenum-doped zinc oxide (MZO) films were successfully prepared by radio frequency (RF) magnetron sputtering method on glass substrates under different substrate temperatures. The nature of MZO film is polycrystalline with hexagonal structure and a preferred orientation along c-axis. With increasing substrate temperature from room temperature to 400℃, the crystallinity of the films is deteriorated and the resistivity increases sharply due to both the decrease of carrier concentration and Hall mobility. The lowest resistivity achieved is 9.2×10^-4 Ω· cm with a high Hall mobility of 30 cm^2·V^-1·s^-1 for the film deposited at room temperature. The average transmttance in the visible range exceeds 85% for all the samples. The optical band gap decreases from 3.30 to 3.25 eV with substrate temperature from room temperature to 400℃.
出处 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2009年第6期785-788,共4页 材料科学技术(英文版)
基金 supported by the Natural Science Foun-dation of China (Grant Nos 60676041 and 10778701)
关键词 Zinc oxide MOLYBDENUM Substrate temperature Magnetron sputtering Zinc oxide Molybdenum Substrate temperature Magnetron sputtering
  • 相关文献

参考文献24

  • 1G. Gustafsson, Y. Cao, G.M. Treacy, F. Klavetter, N. Colaneri and A.J. Heeger: Nature, 1992, 357, 477. 被引量:1
  • 2A. Gupta and A.D. Compaan: Appl. Phys. Lett., 2004, 85, 684. 被引量:1
  • 3M.F.A.M. Van Hest, M.S. Dabney, J.D. Perkins and D.S. Ginley: Thin Solid Films, 2006, 496, 70. 被引量:1
  • 4Y. Meng, X.L. Yang, H.X. Chen, J. Shen, Y.M. Jiang, Z.J. Zhang and Z.Y. Hua: Thin Solid Films, 2001, 394, 219. 被引量:1
  • 5E. Gautier, A. Lorin, J.M. Nunzi, A. Schalchli, J.J. Benattar and D. Vital: Appl. Phys. Lett., 1996, 69, 1071. 被引量:1
  • 6X.W. Xiu, Z.Y. Pang, M.S. Lv, Y. Dai, L.N. Ye and S.H. Ham Appl. Surf. Sci, 2007, 253, 3345. 被引量:1
  • 7X.W. Xiu, Z.Y. Pang, M.S. Lv, Y. Dai, L.N. Ye and S.H. Ham J. Mater. Sci. Technol., 2007, 23(4), 509. 被引量:1
  • 8D.H. Zhang, T.L. Yang, J. Ma, Q.P. Wang, R.W. Gao and H.L. Ma: Appl. Surf. Sci,. 2000, 158, 43. 被引量:1
  • 9H.P. Klug and L. Alexander: X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd edn, John Wiley and Sons, New York, 1974. 被引量:1
  • 10S.S. Lin, J.L. Huang and D.F. Lu: Surf. Coat. Technol., 2004, 176, 173. 被引量:1

同被引文献1

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部