摘要
利用自制微波增强微秒级脉冲辉光放电装置，研究了黄铜样品原子的激发和扩散过程。结果表明，当放电气压低于１８０Ｐａ时，微波等离子体与辉光放电能够很好的耦合，当气压大于２００Ｐａ时，由于样品原子分别受到脉冲辉光放电与微波等离子体的激发，同一条共振线出现了在时间上独立的两个发射峰。利用两发射峰之间的关系可以计算出该工作条件下铜原子和锌原子的扩散速度分别约为１５０和１２９ｍ／ｓ，而辉光放电的最强激发点约离溅射样品表面１．９４～２．２５ｍｍ。
The excitation and diffusion processes of brass sample atoms in a GD MIP tandem source have been studied with a home made MIP boosted μs pulse GD device.Experimental results show that under relatively low discharge pressure(<180Pa),the μs pulse GD can couple quite well with MIP and emit strong radiation of analytical lines.When the GD source is operated under a pressure higher than 200Pa,two emission peaks appear independently in time for a given resonant atomic line,because sample atoms are structurally excited separately first by the μs pulse GD and then by the MIP.According to the two emission peaks,the diffusing velocities of copper atoms and zinc atoms can be calculated,yielding values of 150 and 129m/s,respectively,and the most excited area in the μs pulse GD is about 1 94—2 25mm away from the sputtering surface of the sample cathode.The effects of discharge parameters on emission intensities have been also investigated.
出处
《光谱学与光谱分析》
SCIE
EI
CAS
CSCD
北大核心
1998年第5期565-569,共5页
Spectroscopy and Spectral Analysis
基金
国家自然科学基金
关键词
微秒级脉冲
辉光放电
发射光谱
铜
锌
微波增强
Microsecond pulse
Glow discharge
Microwave induced plasma
Optical emission spectrometry
Tandem source
Excitation and diffusion processes
