摘要
报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术。用这种技术制作可动微机械，动件和固定件同时制作。同现有的牺牲层材料相比，光致抗蚀剂作牺牲层材料具有一些优越性。首先，光致抗蚀剂能直接涂敷，能直接光刻成形。此外，用光致抗蚀剂作牺牲层材料不影响结构的厚度和材料的选择。工艺优化后，结构洁净度、固定件与基片的结合强度及牺牲层去除速度都得到了改善。
This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.Movable elements and fixed elements are fabricated simultaneously.The number of required masks is decreased to the least.Comparing with all the existing sacrificial layer materials,the photoresist being used as sacrificial layers has some advantages.The photoresist can be spin coated simply and patterned directly.Otherwise,using photoresist as sacrificial layers does not restrict the thickness of structures and the choice of materials.After some optimization have been taken,the cleanliness of the structures,the adhesion between the fixed elements and the substrate,the speed of the photoresist removal have been improved.
出处
《光学精密工程》
EI
CAS
CSCD
1998年第5期74-78,共5页
Optics and Precision Engineering
关键词
光致抗蚀剂
牺牲层
可动微机械
微机械
工艺
Photoresist,Sacrificial layers,Movable micromechnical structures
