摘要
本文介绍 0 .35μm(亚半微米 )投影光刻机的机器、硅片、掩模、硅片对准、掩模对准等的坐标系 ,并根据各坐标系讨论套刻时硅片工件台的步进模型。
This paper presents coordinate systems of machine, wafer, mask, wafer and mask alignment which are used for 0 35μm(sub half micron) projection stepper. According to these coordinate systems stepping model of wafer stage for overlay is also discussed.
出处
《微细加工技术》
1998年第3期1-6,共6页
Microfabrication Technology
