期刊文献+

碲镉汞pn结制备技术的研究进展 被引量:4

Developments of HgCdTe pn Junction Fabrication Technologies
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摘要 作为一种禁带宽度可调的半导体,碲镉汞(MCT)至今仍是一种最有效的可在较宽波长(1~25μm)范围内工作的红外探测器。由于材料性质敏感,MCT器件的制备一直是一项具有挑战性的工作。有若干种pn结制备方法可用于制备MCT光伏器件。离子注入是最常用的一种,但该方法需要额外的退火处理。一些替代技术,例如离子束研磨或反应离子刻蚀等,近来年引起较多关注。MCT体晶和外延层的导电类型转换是材料生产和器件制备中最重要的工艺之一。通过对近年来部分英语期刊文献的归纳分析,介绍了MCT pn结制备技术的研究进展。 As one of the tunable bandgap semiconductors, mercury cadmium telluride (MCT) is by far the most efficient infrared detectors that operate in a wide wavelength range ( from 1 to 25 p.m). The fabrication of MCT devices has always been a challenging task due to sensitive nature of the material. Several pn junction fabrication methods are known to make MCT photovoltaic devices. Ion implantation is the most popular one, but it needs additional thermal annealing pr3cess. Some alternative technologies, such as ion beam milling or reactive ion etching, have received considerable attention in recent years. Type conversion of conductivity in MCT crystals and epitaxial layers is one of the most important processes involved into material production and device fabrication. By summarizillg and analyzing some of related papers published in English journals, this paper presents an overview of developments for pn junction fabrication technologies based on MCT over the last few years.
机构地区 昆明物理研究所
出处 《红外技术》 CSCD 北大核心 2009年第9期497-503,共7页 Infrared Technology
关键词 碲镉汞 PN结 光电二极管 焦平面阵列器件 红外探测器 mercury cadmium telluride pn junction photodiode: focal plane array device infrared detector
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参考文献69

  • 1P.Norton.HgCdTe infrared detectors[J].Opto-Electronics Review,2002,10(3):159-174. 被引量:1
  • 2I.M.Baker,C.D.Maxey.Summary of HgCdTe 2D array technology in the U.K.[J].Journal of Electronic Materials,2001,30:682-689. 被引量:1
  • 3V.Sdvastav,R.Pal,B.L.Sharma,et al.Etching of mesa structures in HgCdTe[J].Journal of Electronic Materials,2005,34(11):1440-1445. 被引量:1
  • 4J.Rutkowski.Planar junction formation in HgCdTe infrared detectors[J].Opto-Electronics Review,2004,12(1):123-128. 被引量:1
  • 5W.Gawron,A.Rogalski.HgCdTe buried multi-junction photodiodes fabricated by the liquid phase epitaxy[J].Infrared Physics & Technology,2002,43(3/5):157-163. 被引量:1
  • 6A.I.D'Souza,M.G.Stapelbroek,E.R.Bryan,et al.HgCdTe HDVIP detectors and FPAs for strategic applications[C]//SPIE,2003,5074:146-156. 被引量:1
  • 7楮君浩.窄禁带半导体物理学[M].北京:科学出版社.2005. 被引量:2
  • 8M.Z.Tidrow,W.R.Dyer.Infrared sensors for ballistic missile defense[J].Infrared Physics & Technology,2001,42(3/5):333-336. 被引量:1
  • 9G.L.Hansen,J.L.Schmit,T.N.Casselman.Energy gap versus alloy composition and temperature in Hgt-xCdxTe[J].Journal of Applied Physics,1982,53:7099-7101. 被引量:1
  • 10H.D.Shih,M.A.Kinch,F.Aqariden,et al.Development of gold-doped HgCdTe for very-long-wavelength infrared detectors[J].Applied Physics Letters,2003,82(23):4157. 被引量:1

二级参考文献90

  • 1Antoni Rogalski. Toward third generation HgCdTe infrared detectors[J].Journal of Alloys and Compounds, 2004, 371(1): 53-57. 被引量:1
  • 2A. Rogalski. HgCdTe infrared detector material: history, status and outlook[J]. Reports on Progress in Physics, 2005, 68(10): 2267-23360. 被引量:1
  • 3A. Rogalski. Material considerations for third generation infrared photon detectors[J],Infrared Physics and Technology, 2007, 50(2/3): 240-252. 被引量:1
  • 4Krzysztof Jozwikowski, Richard Sewell, Charles Musca, et al. Noise modeling in HgCdTe heterostructure devices[J]. Journal of Applied Physics, 2003, 94(10): 6541. 被引量:1
  • 5Sudha Gupta, R.K. Bhana, V. Dhar. Unified carrier density approximation for non-parabolic and highly degenerate HgCdTe semiconductors covering SWIR, MWIR and LWIR bands[J]. Infrared Physics and Technology, 2008, 51(3): 259-262. 被引量:1
  • 6R. K. Bhan, V. Gopal, R. S. Saxena, et al. Noise modeling of shunt resistance in HgCdTe photoconductor detectors[J]. Infrared Physics and Technology, 2004, 45(2): 81-92. 被引量:1
  • 7Y. Chang, G. Badano, J. Zhao, et al. Formation mechanism of crater defects on HgCdTe/CdZnTe (211) B epilayers grown by molecular beam epitaxy[J]. Applied Physics Letters, 2003, 83(23): 4785. 被引量:1
  • 8R. K. Bhan, V. Dhar. Improved model for surface shunt resistance due to passivant for HgCdTe photoconductive detectors[J]. Semiconductor Science and Technology, 2003, 18(12): 1043-1054. 被引量:1
  • 9J. G. A. Wehner, C. A. Muscaa, R. H. Sewell, et al. Responsivity and lifetime of resonant-cavity-enhanced HgCdTe detectors[J]. Solid State Electronics, 2006, 511(9): 1640-1648. 被引量:1
  • 10E. P. G. Smith, C. A. Musca, L. Faraone. Material considerations for third generation infrared photon detectors[J]. Infrared Physics and Technology, 2000, 41(3): 175-186. 被引量:1

共引文献8

同被引文献88

  • 1张国栋,孙维国,倪永平.Mg离子注入成结制备InSb光电二极管阵列研究[J].红外与激光工程,2005,34(1):19-22. 被引量:5
  • 2叶振华,郭靖,胡晓宁,何力.HgCdTe焦平面探测阵列干法技术的刻蚀速率研究[J].激光与红外,2005,35(11):829-831. 被引量:7
  • 3戴忠玲,毛明,王友年.等离子体刻蚀工艺的物理基础[J].物理,2006,35(8):693-698. 被引量:19
  • 4Yong Chang, C R Becker, C H Grein, et al. Surface morphology and defect formation mechanisms for HgCdTe (211)B grown by molecular beam epitaxy [J]. Journal of Electronic Materials, 2008, 37(9): 1171-1183. 被引量:1
  • 5J D Benson, L A Almeida, M W Carmody, et al. Surface structure of molecular beam epitaxy (211)B HgCdTe[J]. Journal of Electronic Materials, 2007, 36(8): 949-957. 被引量:1
  • 6E Selvig, C R Tonheim, T Lorentzen, et al. Defects in HgTe and CdHgTe grown by molecular beam epi- taxy [J]. Journal of Electronic Materials, 2008, 37(9): 1444-1452. 被引量:1
  • 7John A Roth, Brett Z Nosho, John E Jensen. Fullwafer spatial mapping of macrodefects on HgCdTe epitaxial wafers grown by MBE [J]. Journal of Electronic Materieds, 2006, 35(6): 1503-1508. 被引量:1
  • 8L A Almeida, M Groenert, J H Dinan. Influence of substrate orientation on the growth of HgCdTe by molecular beam epitaxy [J]. Journal of Electronic Materials, 2006, 35(6): 1214-1218. 被引量:1
  • 9Majid Zandian, D Scott, J Garnett, et al. Teninch molecular beam epitaxy production system for HgCdTe growth [J]. Journal of Electronic Materials, 2005, 34(6): 891-897. 被引量:1
  • 10A A Buell, L T Pham, M D Newton, et al. Physical structure of molecular-beam epitaxy growth defects in HgCdTe and their impact on two-color detector performance [J]. Journal of Electronic Materials, 2004, 33(6): 662-666. 被引量:1

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