期刊文献+

Fabrication and photoelectrical characteristics of ZnO nanowire field-effect transistors

Fabrication and photoelectrical characteristics of ZnO nanowire field-effect transistors
原文传递
导出
摘要 The fabrication and photoelectrical characteristics of suspended ZnO nanowire (NW) field-effect transistors (FETs) are presented. Single-crystal ZnO NWs are synthesized by a hydrothermal method. The fabricated FETs exhibit excellent performance. When Vds=2.5 V, the peak transconductance of the FETs is 0.396 μS, the average electron mobility is 50.17 cm2/(V·s), the resistivity is 0.96 × 102 Ω·cm at Vgs = 0 V, and the current on/off ratio (Ion/Ioff) is approximately 105. ZnO NW-FET devices exposed to ultraviolet radiation (2.5 μW/cm2) exhibit punch-through and threshold voltage (Vth) shift (from-0.6 V to +0.7 V) and a decrease by almost half of the source-drain current (Ids, from 560 nA to 320 nA) due to drain-induced barrier lowering. Continued work is underway to reveal the intrinsic properties of suspended ZnO nanowires and to explore their device applications. The fabrication and photoelectrical characteristics of suspended ZnO nanowire (NW) field-effect transistors (FETs) are presented. Single-crystal ZnO NWs are synthesized by a hydrothermal method. The fabricated FETs exhibit excellent performance. When Vds=2.5 V, the peak transconductance of the FETs is 0.396 μS, the average electron mobility is 50.17 cm2/(V·s), the resistivity is 0.96 × 102 Ω·cm at Vgs = 0 V, and the current on/off ratio (Ion/Ioff) is approximately 105. ZnO NW-FET devices exposed to ultraviolet radiation (2.5 μW/cm2) exhibit punch-through and threshold voltage (Vth) shift (from-0.6 V to +0.7 V) and a decrease by almost half of the source-drain current (Ids, from 560 nA to 320 nA) due to drain-induced barrier lowering. Continued work is underway to reveal the intrinsic properties of suspended ZnO nanowires and to explore their device applications.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第8期60-62,共3页 半导体学报(英文版)
基金 supported by the State Key Development Program for Basic Research of China(No.2002CB311901) the Director Fund of the Institute of Microelectronic of the Chinese Academy of Sciences (No.O8SB034002) the Pre-Research Fund of Weap on Equipment (No.6150105040)
关键词 ZnO nanowire BACK-GATE suspended field-effect transistor ultraviolet radiation ZnO nanowire back-gate suspended field-effect transistor ultraviolet radiation
  • 相关文献

参考文献1

二级参考文献24

  • 1Paradis E L,Shuskus A J 1976 Thin Solid Films 38 131 被引量:1
  • 2Chubachi N 1976 Proc.IEEE 64 772 被引量:1
  • 3Kadota M 1997 Jpn.J.Appl.Phys.Ⅰ 36 3076 被引量:1
  • 4Wong E M,Secrson P C 1999 Appl.Phys.Lett.74 2939 被引量:1
  • 5Cao H,Zhao Y G,Ho S T et al 1999 Phys.Rev.Lett.82 2278 被引量:1
  • 6Yao Z G,Zhang X Q,Shang H K et al 2005 Chin.Phys.14 1205 被引量:1
  • 7Wang Z J,Wang Z J,Li S C et al 2004 Chin.Phys.13 750 被引量:1
  • 8Tang Z K,Wong G K,Yu P et al 1998 Appl.Phys.Lett.72 3270 被引量:1
  • 9Zu P,Tang Z K,Wong G K L et al 1997 Solid State Commun.103 459 被引量:1
  • 10Jung S W,Park W I,Cheong H D et al 2002 Appl.Phys.Lett.80 1924 被引量:1

共引文献19

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部