摘要
介绍了在ＮＨ４Ｆ介质中制备薄而均匀的２３３Ｐａ镀层的实验方法。对２３３Ｐａ电沉积的主要影响因素（电流密度、搅拌速度、电镀时间和溶液的ｐＨ等）进行了实验，得到了在不锈钢片上电沉积厚度为１ｍｇ／ｃｍ２的２３３Ｐａ源。同时观察了用不同阴极材料对电沉积２３３Ｐａ源厚度及电沉积效率的影响，提出了在不锈钢片上制备２３３Ｐａ源的工艺流程。
he experimental method for preparation of thin and uniform Palayers in the solution of NH4F is studied. The main factors, including current density, stirring rate, electroplating time and pH value of solution which influence the electrodeposition of Pa are experimented. The influence of different anode materials with the thickness and efficiency of electrodeposition source is also observed. The electroplating Palayer of 1 mg/cm2 thickness on thin stainless steel disk is obtained. The industrial procedure of Pa preparation in the stainless steel plate is given.
出处
《同位素》
CAS
1998年第2期65-69,共5页
Journal of Isotopes
基金
国家自然科学基金
