摘要
ZrxCu100-x amorphous films are prepared on Si （111） substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability （GFA） of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x = 65. It is therefore different from the bulk counterparts, for which only x = 35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure.
ZrxCu100-x amorphous films are prepared on Si （111） substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability （GFA） of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x = 65. It is therefore different from the bulk counterparts, for which only x = 35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure.
基金
Supported by the National Natural Science Foundation of China under Grant Nos 50731005, 50774006 and 50821001, the National Basic Research Program of China under Grant Nos 2006CB605201 and 2007CB616915, and the Programme for Changjiang Scholars and Innovative Research Team in University （PCSIRT） under Grant No IRT0650.
