摘要
以铋系超导薄膜材料为例,应用X射线反射法测量薄膜材料的厚度以及粗糙度等结构参数,对测量方法的原理、衍射仪的调试和步骤等进行了详细的说明。这一方法为薄膜材料结构参数的测量提供了新途径。
The method to measure the thickness and toughness of Bi superconducting thin film by X-ray refleetivity was studied. The principle of measurement and the setting steps of X-ray diffractometer were detailed introduced. This is a new method to study the properties of thin film.
出处
《理化检验（物理分册）》
CAS
2009年第6期345-347,共3页
Physical Testing and Chemical Analysis(Part A:Physical Testing)
基金
沈阳市大型科学仪器网资助项目
关键词
X射线反射法
薄膜
厚度
X-ray reflectivity
thin film
thickness
