摘要
主要介绍一种统计筛选实验方法，能快速找到对工艺影响最大的工艺参数，从而缩短工艺评估周期，这些参数包括：前烘温度、胶厚、PEB温度、显影温度、显影时间、显影波浓度、显影搅动。
The paper introduces a statistically designed screening experimental method which can lead to a much shorter process evaluation cycle,and determine the most significant process factors. The process factors include:softbake temperature,resist coat thickness, post exposure bake temperature, develop temperature, develop time, develop concentration, develop agitation.
出处
《微处理机》
1998年第2期10-14,共5页
Microprocessors
关键词
VLSI
光刻工艺
数值孔径g线
镜头
优化
实验
optical lithography, photoresist, develop, depth of focus, screening experiments, optimized process
