摘要
讨论了用射频（ＲＦ）磁控溅射制作铁磁性薄膜工艺，合适的工艺参数能够获得较低的矫顽力Ｈｃ＝６Ｏｅ。用Ｘ射线光电子能谱（ＸＰＳ）和原子力显微镜（ＡＦＭ）研究膜表面情况及氧化深度。
In this paper, the process fabricating Fe thin film by RF magnetron sputtering was discussed. Lower coercive force Hc=6 Oe was achieved under optimum parameters. The surface and depth of Fe thin film were studied by xray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).
出处
《材料工程》
EI
CAS
CSCD
北大核心
1998年第5期31-33,共3页
Journal of Materials Engineering
