摘要
基于OOPIC软件,对平面直流磁控溅射放电等离子体进行了二维自洽粒子模拟,重点研究了磁场、阴极电势和气压等工作参数对磁控放电特性的影响。模拟发现,在一定的工作参数范围内,随着磁场的增强,鞘层厚度变窄,鞘层电势降减小,阴极离子密度增大,但是分布变窄;随着阴极电势的增加,鞘层厚度稍微变窄,鞘层电势降增大,阴极离子密度增大,分布变宽;随着气压的升高,鞘层厚度基本不变,鞘层电势降会增大,阴极离子密度先增大后减小,分布略微变宽。
A 2D self-consistent PIC/MCC software OOPIC is used to simulate the plasma properties in the planar de magnetron sputtering system, and then the influence of parameters such as the magnetic field, cathode voltage and gas pressure on the discharge characteristics is discussed. The results show that, in a definite range of operation parameters, the sheath thickness becomes narrower and the sheath potential fall （SPF） reduces, the ion density on the cathode （IDOTC） increases but its distribution becomes narrower as the magnetic field is strengthened; , the sheath thickness becomes a little narrower and SPF increases, IDOTC increases and the distribution becomes wider as the increase of cathode voltage; the sheath thickness keeps constant almost and SPF increases, IDOTC increases firstly and then decreases, the distribution becomes a little wider as the increase of gas pressure.
出处
《核聚变与等离子体物理》
CAS
CSCD
北大核心
2009年第2期182-188,共7页
Nuclear Fusion and Plasma Physics
