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非线性曝光对三维全息光子晶体禁带特性的影响 被引量:3

The effect of nonlinear exposure on bandgap of three-dimensional holographic photonic crystal
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摘要 从理论和实验两方面研究了非线性曝光对全息方法制作光子晶体的影响.使用低折射率材料(n=1.52)制作了金刚石结构光子晶体,通过控制曝光量使记录介质工作在非线性曝光区域,发现光子禁带的特性得到了明显的改善.并由此提出了用低折射率材料实现全空间禁带的设想. The effect of nonlinear exposure on the characteristics of photonic crystal fabricated by holography is investigated theoretically and experimentally. A kind of materials with low refractive index ( n = 1.52) is used to fabricate diamond structure. By controlling the exposure in strong nonlinear range, the property of photonic bandgap is improved. Also, some proposals are made to achieve complete band gaps by materials with low refractive index.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2009年第5期3208-3213,共6页 Acta Physica Sinica
基金 国家自然科学基金(批准号:60277014和60677006)资助的课题~~
关键词 光子晶体 光学全息 非线性曝光 photonic crystal, holography, non-linear exposure
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