摘要
OPTICAL emission spectroscopy (OES) is generally used in diagnosis on the various plasma filmdeposition processes to understand the mechanism of film growth. However, although the de-position precursors have been predicted such as CN radicals and nitrogen atoms, up tonow no diagnostic work on CN_x film deposition process, as we know, has been reported yet.From previously reported research work, the properties of CN_x film display some obvious dif-ference. For instance, some CN_x films have extreme mechanical properties with hardness
