摘要
利用非平衡磁控溅射复合靶技术制备了一系列掺钛的无氢类金刚石(Ti-DLC)薄膜,并对薄膜的热稳定性能、机械性能、应力分布以及表面形貌进行了研究。实验结果表明:退火处理对Ti-DLC膜的性能具有重要影响。随着热处理温度的升高,成膜晶粒逐渐细化,电阻率上升但至一定值后趋于稳定。退火温度的升高,会促使薄膜应力逐渐减小,硬度变低,但其耐火温度可以达到600℃以上而不发生石墨化,这一结果为DLC膜在高温环境下的应用提供了一定思路。
Ti-doped diamond-like carbon（Ti-DLC） films were deposited by unbalanced magnetron sputtering （UBMS） process with composite targets. The thermal stability, mechanical properties, stress distribution and surface morphology of the films were investigated. The results showed that with the increasing annealing temperature the grain refining comes to pass gradually and the resistivity increases to a certain value then becomes stable. Moreover, the increasing annealing temperature enables the film stress to decrease gradually with hardness decreased. It was also indicated that no graphitization is found in the films even though the annealing temperature comes up to over 600℃.
出处
《真空》
CAS
北大核心
2009年第2期29-32,共4页
Vacuum
关键词
类金刚石膜
非平衡磁控溅射
钛掺杂
复合靶
热稳定性
unbalanced magnetron sputtering （UBMS）
diamond-like carbon （DLC） film
Ti-doping
composite targets
thermal stability
