摘要
描述了双温区井式炉的静态与动态温度分布、指出了工艺上的三个要素及调整技巧，并列举了批量生产出的消磁片、过流保护片与延时片的测试结果，介绍了双温区井式炉的二次烧结技术，提供了一种提高ＰＴＣ热敏电阻性能的新思路、新方法．
The static and dynamic temperature distribution in the well type two zone furnace are described. It is pointed out that the temperature T 1 of constant temperature terrace in high temperature zone, the temperature T 2 of that in lower temperature zone and the moving speed V are three essential technological factors. The skill of the adjustment of three essential factors and the results of the ceramic wafers are given. Second sintering technology using well type two zone furnace is also presented. By means of this technology, not only the highly difficultly sintered PTC semistors can be prepared, but also the properties of the wafers are improved.
出处
《华中理工大学学报》
CSCD
北大核心
1998年第3期13-15,共3页
Journal of Huazhong University of Science and Technology
关键词
双温区井式炉
温度分布
二次烧结
热敏电阻
well type two zone furnace
temperature distribution
constant temperature terrace
second sintering
