摘要
用多弧离子镀方法在DZ4镍基合金基体上沉积3μm厚Al膜,用强流脉冲电子束辐照处理,加速电压为27kV,束流密度为1.5J/cm2,脉冲数为1次、5次和10次。SEM表面分析显示,脉冲处理后薄膜表面平整度随脉冲次数增加,但10次脉冲处理后有明显的微裂纹。电子束处理后有熔坑和喷发现象,5次脉冲处理后喷发现象最明显。截面的EPMA分析显示,电子束处理使Al膜与基体间混合。掠入射XRD分析表明,随着脉冲次数增加,Al含量减少,基体Ni含量增加,1次脉冲处理有非晶成份出现,多次脉冲处理后有NiAl新相出现,有利于薄膜耐腐蚀性能的提高。电子束辐照Al膜的耐腐蚀性能明显提高,自腐蚀电位提高约70%。
Aluminum films of 3 μm were deposited on DZ4 alloy by multi-arc ion plating, and were treated by HCPEB （high-current pulse electron beam） at 27 kV in a flux density of 1.5 J/cm^2 with the pulse frequency being 1, 5 or 10. SEM images of the samples show that the Al film treated by one pulse became leveled, and the surface smoothness increased with the pulse frequency, but the film treated by 10 pulses had obvious micro crack appearance. Melt pit and eruption phenomenon were observed in the treated films, with the 5-pulse treated being the most obvious. Scanning electron probe microscopy analysis of the film cross-section revealed that the film had been mixed with the substrate. Glancing incidence XRD analysis of the films indicated that, with increasing pulse frequency, the film＇s Al content reduced, and the Ni content of the substrate increased. The film treated by one pulse had non-crystalline phase, while the multi-pulse processed films had new phase of NiAI, which is advantageous in improving anti-corrosive performance enhancement of the film. An improvement of about 70% was observed in corrosion electric potential test of the 10-pulse irradiated film.
出处
《核技术》
CAS
CSCD
北大核心
2009年第3期161-164,共4页
Nuclear Techniques
基金
国家自然科学基金(10875021)
沈鼓-大工核级泵专项科研探索基金资助
关键词
强流脉冲电子束
DZ4合金
表面合金化
High-current pulse electron beam, DZ4 alloy, Surface alloying
