摘要
为了揭示偏压对溅射态Fe-N薄膜磁学行为的影响规律及机理,采用直流磁控溅射工艺在不同偏压下制备了Fe-N薄膜.利用掠入射X射线衍射、小角X射线散射技术和振动样品磁强计研究了薄膜的相结构、厚度、表面粗糙度以及磁性能.结果表明,增加偏压有利于薄膜中非晶的形成,且随着偏压的增大,薄膜的厚度增加,表面粗糙度降低.Fe-N薄膜的磁性能表明,随着偏压的增加,薄膜的饱和磁化强度和矫顽力均有不同程度的减小.偏压的增加导致Fe-N薄膜由晶态向非晶态转变,从而引起磁性能的改变.
Fe -N thin films were prepared by DC magnetron sputtering process with different bias voltages in order to study the effect of bias voltage on magnetic properties of sputtered Fe - N thin films. The phase structure, thickness, surface roughness and magnetic properties of the thin films were studied by means of grazing incidence X-ray diffraction, small angle X-ray scattering technique and vibrating sample magnetometer. The results show that the bias voltage is propitious to the formation of amorphous phase in the film, and with increasing bias voltage, the film thickness increases and the surface roughness of the thin film decreases. The saturation magnetization and coercivity of Fe - N thin films decrease with increasing bias voltage. The increase of bias voltage can lead to the transformation of Fe - N thin films from crystalline to amorphous, which results in the change of magnetic properties.
出处
《材料科学与工艺》
EI
CAS
CSCD
北大核心
2008年第6期773-775,780,共4页
Materials Science and Technology
关键词
FE-N薄膜
偏压
膜厚
表面粗糙度
磁性能
Fe - N thin films
bias voltage
film thickness
surface roughness
magnetic properties
