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辐射引发 4-(甲基丙烯酸)2,2,6,6-四甲基哌啶醇酯在聚丙烯上的接枝

RADIATION INDUCED GRAFTING OF TMPM ONTO POLYPROPYLENE
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摘要 利用共辐照法将4(甲基丙烯酸)2,2,6,6四甲基哌啶醇酯(TMPM)接枝共聚在聚丙烯上。研究不同条件对接枝率的影响。研究表明在苯、四氯化碳和石油醚等溶剂中接枝率比在其它溶剂中要高;在氩气中辐照的接枝率比在空气中的高。在苯中,接枝率在10~60kGy的范围内呈线性增长,大于60kGy出现偏低;在CCl4中,接枝率在10~50kGy的范围内呈线性增长,大于50kGy出现偏低。在0~2.85mol/L的浓度范围内接枝率随单体浓度的增加而增加,只有在浓度低于114mol/L时接枝率随浓度增长较快。添加阻聚剂的样品接枝率比不添加阻聚剂的低,在低剂量时相差较大,随着剂量的增大,这种差别越来越小。研究接枝TMPM对聚丙烯耐辐射稳定性能的影响,发现添加接枝共聚物的聚丙烯比添加未接枝的TMPM的聚丙烯更耐辐射。 The gamma radiation induced graft copolymerization of 2,2,6,6 tetramethyl 4 piperidinyl methacrylate (TMPM), a very effective hindered amine light stabilizer (HALS), onto polypropylene was investigated by simultaneous irradiation technique. The effects of various synthesis conditions on the graft content were studied. It was shown that percent grafting in benzene, CCl 4 and petroleum ether were higher than that in other solvents. The percent grafting was higher when graft copolymerization was carried out in argon atmosphere than that in air. For the grafting copolymerization carried out in benzene, percent grafting increased linearly from 10 to 60 kGy and beyond 60 kGy a tendency to level off was appeared. In CCl 4, percent grafting increased linearly from 10 to 50 kGy and beyond 50 kGy a tendency to level off was appeared. Percent grafting also increased continuously with increasing monomer concentration up to 2.85mol/L, but significant increase was observed only up to 1 14 mol/L. The percent grafting decreased when inhibitor was used, the difference of percent grafting between the samples with and without inhibitor became smaller with the increase of irradiation dose. The stabilizing effectiveness of grafted TMPM on the radiation resistance of Polypropylene was found to be better than that of TMPM monomer.
作者 汪辉亮 陈文
出处 《辐射研究与辐射工艺学报》 CAS CSCD 北大核心 1998年第1期5-9,共5页 Journal of Radiation Research and Radiation Processing
关键词 辐射接枝 聚丙烯 受阻胺光稳定剂 TMPM Radiation induced grafting Polypropylene Hindered amine light stabilizer (HALS)
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参考文献3

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