摘要
利用ｍｅｔａｌｖａｐｏｒｖａｃｕｕｍａｒｃ离子源产生的Ｃ＋离子，注入单晶Ｓｉ衬底，得到了ＳｉＣ埋层．利用Ｘ射线光电子能谱，研究了ＳｉＣ埋层中Ｓｉ２ｐ的特征能量损失谱．结果表明：Ｓｉ２ｐ的特征能量损失谱依赖于ＳｉＣ埋层中Ｃ原子的浓度分布，并且与ＳｉＣ埋层的有序度对应．
Abstract SiC buried layers were snythesized by a metal vapor vacuum arc ion source,with C + ions implanted into crystalline Si substrates.According to X ray photoelectron spectroscopy,the characteristic electron energy loss spectra of the SiC buried layers were studied.It was found that the characteristic electron energy loss spectra depend on the profiles of the carbon content,and correlate well with the order of the buried layers.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1998年第5期876-880,共5页
Acta Physica Sinica
