摘要
为分析并避免参考零点误差对凹球面光刻恒定曝光量控制算法的影响,建立了零点误差与扫描线速度、扫描弧长关系的数学模型并给出了关系曲线。分析得出:参考零点俯仰定位误差会造成部分线条宽于理想值,其余线条窄于理想值,且线宽呈单调变化;参考零点水平定位误差会造成实际扫描弧长短于或长于所需值,造成凹球面部分边缘无线条以致网栅缺失。凹球面网栅光刻设备俯仰轴和方位轴采用光电轴角编码器作为反馈元件,采取速度、位置双闭环控制,实现了参考零点的精确定位,确保了恒定的扫描线速度和精确的扫描弧长,制作出了合格的凹球面网栅。
For analyzing and avoiding the influences resulting from zero position error of control algorithm for controlling the exposure dose invariably on the Concave Spherical Substrate （CSS） via photolithography technology, the mathematical models and relation curves of zero position error versus scanning linear velocity and arc length are deduced and given respectively. After analyzing the relation curves, the influences resulting from zero position error are obtained as follows： vertical zero position error causes that line width of parts of lines are wider or narrower than ideal value and line width change monotonically, and the level zero position error causes that actual scanning arc length is longer or shorter than required value, which results in parts of edge of the CSS lacking of lines even grids. The opto-electronic encoders are adopted as feedback sensor of vertical and level axes, and the velocity and position dual closed-loop control method is taken, which realizes the zero positioning precisely and guarantees the exposure dose invariably, as well as scanning arc length accurately. Several eligible concave spherical meshes have been fabricated.
出处
《光电工程》
EI
CAS
CSCD
北大核心
2008年第12期122-125,共4页
Opto-Electronic Engineering
基金
国防科技预研基金资助项目
关键词
凹球面
网栅
光刻
控制
误差分析
concave spherical substrate
mesh
photolithography
control
error analysis
