摘要
以SnCl2.2H2O为原料,采用压缩喷雾热分解的方法在玻璃衬底和石英片衬底上制得氧化锡薄膜。采用X射线衍射仪(XRD)和扫描电镜(SEM)分别对薄膜的内部结构和表面形貌进行了表征。研究表明,500℃下制备的薄膜比较致密平整;320℃下,喷雾50 min制得的薄膜的X射线衍射峰强度较强;相同喷雾时间下,当温度达到380℃时,X射线衍射峰的强度大幅度提高。
By using SnCl2 · 2H2O as raw material , the pure SnO2 thin films were prepared on the glass and quartz flat substrates by spray pyrolysis process. The crystal structure and surface morphology of the thin films were characterized by using XRD and SEM. The films which were prepared at 500 ℃ are smooth and fine. At 320 ℃, the films which were prepared for 50 min show relatively strong diffraction peak. At the same spray time, the strength of diffraction peak is enhanced when the temperature is 380 ℃.
出处
《石油化工高等学校学报》
EI
CAS
2008年第4期15-17,22,共4页
Journal of Petrochemical Universities
基金
北京市教育委员会科技发展计划项目(No.KM200610017009)
关键词
氧化锡薄膜
喷雾热分解
制备
Tin dioxide thin film
Spray pyrolysis
Preparation
