摘要
利用直流电弧等离子体喷射法沉积装置在底径Ф65mm高5mm的Mo球面衬底上成功制备出纳米金刚石薄膜，文章研究了在稳定电弧状态下碳氢比对金刚石膜形貌的影响。通过扫描电子显微镜、原子力显微镜及Raman光谱对样品的晶粒尺寸及质量进行了表征。研究结果表明：在稳定电弧状态下，通过提高碳氢比可以在Mo球面衬底上的表面高速沉积出高质量的纳米金刚石薄膜，晶粒尺寸大约为4-80nm，平均粒径27．4nm。
Nano-diamond films were gown up via the technique of DC Arc Plasma Jet on Mo spherical substrate of 65mm bottom diameter and 5 mm height. Effect of CH4 concentration on morphology of diamond films was investigated. The grain size and quality of the samples was characterized with a combination of Raman spectroscopy, atomic force microscopy （AFM） and Scanning Electron Microscope （SEM）. The results show that the high quality nano-diamond film can be deposited on Mo spherical substrate by increasing the CH4 concentration, the grain size was observed to be approximately 4-80 nm and the mean grain diameter was 27.4nm by AFM. DC Arc Plasma Jet CVD is very suitable for high-speed and high-quality deposition of nano-diamond films.
出处
《超硬材料工程》
CAS
2008年第5期1-4,共4页
Superhard Material Engineering
基金
国家自然科学基金(项目号:50275076)
