摘要
本文重点讨论了用不同的工艺方法来制备薄膜磁头中的关键元件-磁轭。采用多次光刻的方法克服湿法工艺中磁性膜NiFe层的侧向钻蚀问题，从而实现对磁轭几何尺寸的精确控制，并对几种工艺方法的优缺点作了比较详细的分析。
Difference manufacture methods for fabricating the key element-thin film magnetic pole was discussed. Repeated photolithography were used to overcome the side over-etching problems of NiFe film in the wet process, realizing the precise control of the geometric size of magnetic pole. Also, the advantages anddisadvantages of different manufacture process were. analyzed in detail.
出处
《微细加工技术》
1997年第3期58-62,共5页
Microfabrication Technology
关键词
磁轭
磁头
薄膜磁头
电化刻蚀
钻蚀
magnetic pole
magnetic film head
electrochemistry-etching over-etching
