摘要
X射线的反射(XRR)测量法可精确地确定平行层及其薄膜结构,如测定光滑基体上聚合物膜的特性,包括层的厚度、密度和界面粗糙度。使用X’Pert X射线粉晶衍射仪对单晶硅片上的有机薄膜镀层进行了其厚度的精确测定,测定结果为该单晶硅片上的有机薄膜有3层,其厚度分别为5.0、60.2和245.3nm。并用倒易向量方法计算和验证了测量结果的正确性。还讨论了用X射线反射测定薄膜结构的一些影响因素。
X-ray reflection measurement can be used to determine the structure of parallel layers and their thin films accurately.For example, it is effective in the determination of polymer film on smooth base such characteristics as the thickness,density of the film and roughness of the interface.The authors employ X＇Pert X-ray diffractometer and accurately measure the thickness of organic film coated on a single crystal silicon plate.The result shows that there are three films on the plate with thickness of 5.0,60.2 and 245.3nm respectively.They also calculate the result so as to confirm its correctness through the use of reciprocal vector method.They further their discussion on factors that may have influence on the accuracy of the measurement
出处
《功能材料》
EI
CAS
CSCD
北大核心
2008年第2期199-201,共3页
Journal of Functional Materials
基金
国家自然科学基金资助项目(49772095)
关键词
X射线反射
有机薄膜
薄膜厚度测定
X-ray reflection
organic film
thickness measurement of thin films
