期刊文献+

用逆压电极化模型对AlGaN/GaN高电子迁移率晶体管电流崩塌现象的研究 被引量:5

Research on the current collapse in AlGaN/GaN high-electron-mobility transistors through the inverse piezoelectric polarization model
原文传递
导出
摘要 通过自洽求解一维Poisson-Schrdinger方程,模拟了AlGaN/GaN高电子迁移率晶体管在工作时等效外电场对AlGaN/GaN异质结沟道处二维电子气(2DEG)浓度的影响.分析了逆压电极化效应的作用,从正-逆压电极化现象出发,提出了逆压电极化模型.计算结果显示:逆压电极化明显影响2DEG性质,当Al组分x=0.3,AlGaN层厚度为20nm时,不考虑逆压电极化,2DEG浓度为1.53×1013cm-2;当等效外电压分别为10和15V时,2DEG浓度降低至1.04×1013cm-2和0.789×1013cm-2.用该模型解释了2DEG退化及电流崩塌现象产生的原因,并讨论了抑制电流崩塌的办法. Current collapse in AlGaN/GaN high-electron-mobility transistors was studied and the effect of effective external electrical field on the concentration of two-dimensional electron gas (2DEG) near the channel of hetero-junction of AlGaN/GaN was simulated through the self-consistent implementation of the one-dimensional Poisson-Schrodinger equations. An inverse piezoelectric polarization model was proposed to analyze the degradation of 2DEG and the current collapse. It was found that the density of 2DEG was strongly dependent on the inverse polarization. When the voltage was 0,10 and 15 V, the density was 1.53 × 10^13 cm^-2 , 1.04 × 10^13 cm^-2 and 0.789 × 10^13cm^-2 , respectively. It was clear that the 2DEG density dropped 48.4% with voltage increasing from 0 to 15 V when the inverse piezoelectric polarization was considered. At last, the method of restraining current collapse was further discussed.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2008年第4期2450-2455,共6页 Acta Physica Sinica
基金 国家重点基础研究发展规划(批准号:51327030402) 天津市自然科学基金(批准号:07JCZDJC06100)资助的课题~~
关键词 ALGAN/GAN高电子迁移率晶体管 Poisson-Schrodinger方程 逆压电极化模型 电流崩塌 AlGaN/GaN high-electron-mobility transistors, Poisson-Schrodinger equations, inverse piezoelectric polarization model, current collapse
  • 相关文献

参考文献13

  • 1Khan M A, Bhattarai A R, Kuznia J N, Olson D T 1993 Appl. Phys. Lett. 63 1214 被引量:1
  • 2郝跃,张金凤.AlGaN/GaN界面特性研究进展[J].微纳电子技术,2002,39(10):1-7. 被引量:5
  • 3Majewski J A, Zandler G, Vogl P 2002 J. Phys. 14 3511 被引量:1
  • 4Wu Y F, Keller B P, Kellers S,, Kapolnek D, Denbaars S P, Mishra U K 1996 IEEE Electron. Dev. Lett. 17 455 被引量:1
  • 5Daumiller I, Theron D, Gaquiere C, Vescan A, Dietrich R, Wieszt A, Leier H, Vetury R, Mishra U K, Smorchkova I P, Keller S, Nguyen C, Kohn E 2001 IEEE Electron. Dev. Lett. 22 62 被引量:1
  • 6Hasegawa H, Inagaki T, Otomo S, Hashizume T 2003 J. Vac. Sci. Technol. 21 1844 被引量:1
  • 7Mizutani T, Ohno Y, Akita M, Kishimoto S, Maezawa K 2003 IEEE Trans. Electron. Dev. .50 2015 被引量:1
  • 8Tarakji A, Simin G, Ilinskaya N, Hu X, Kumar A, Koudymov A, Yang J, Asifkhan M 2001 Appl. Phys. Lett. 78 2169 被引量:1
  • 9Ambacher O, Smart J, Shealy J R, Weimann N G, Chu K, Murphy M, Schaff W J, Eastman L F, Dimitrov R, Wittmer L, Stutzmann M, Rieger W, Hilsenbeck J 1999 J. Appl. Phys. 85 3222 被引量:1
  • 10孔月婵,郑有炓,周春红,邓永桢,顾书林,沈波,张荣,韩平,江若琏,施毅.AlGaN/GaN异质结构中极化与势垒层掺杂对二维电子气的影响[J].物理学报,2004,53(7):2320-2324. 被引量:11

二级参考文献12

  • 1孔月婵 等.物理学报,2003,52:1756-1756. 被引量:3
  • 2Jogai B 2003 J.Appl.Phys.93 1631 被引量:1
  • 3Chu R M,Zheng Y D,Zhou Y G,Gu S L,Shen B and Zhang R 2003 Opt.Mater.23 207 被引量:1
  • 4Jiang C P,Guo S L,Huang Z M,YuJ,Gui Y S,Zheng G Z,Chu J H,Zheng Z W,Shen B and Zheng Y D 2001 Appl.Phys.Lett.79 374 被引量:1
  • 5Antoszewski J,Gracey M,Dell J M,Faraone L,Fisher T A,Parish G,Wu Y F and Mishra U K 2000 J.Appl.Phys.87 3900 被引量:1
  • 6Ambacher O,Foutz B,Smart J,Shealy J R,Weimann N G,Chu K,Murphy M,Sierakowski A J,Schaff W J,Eastman L F,Dimitrov R,Mitchell A and Stutzmann M 2000 J.Appl.Phys.87334 被引量:1
  • 7Oberhuber R,Zandler G and Vogl P 1998 Appl.Phys.Lett.73 818 被引量:1
  • 8Mae da N,Nishida T,Kobayashi N and Tomizawa M 1998 Appl.Phys.Lett.73 1856 被引量:1
  • 9Hsu L and Walukiewiez W 1998 Appl.Phys.Lett.73 339 被引量:1
  • 10Ambacher O,Smart J,Shealy J R,Weimann N G,ChuK,Murphy M,Schaff W J,Eastman L F,Dimitrov R,Wittmer L,Stutzmann M,Rieger W and Hilsenbeck J 1999 J.Appl.Phys.85 3222 被引量:1

共引文献14

同被引文献97

  • 1马梅,蔡蕾,王兴福,胡经国.掺杂下铁磁/反铁磁双层膜中交换偏置的增强[J].物理学报,2007,56(1):529-534. 被引量:4
  • 2郭子政,时东陆.纳米材料和器件导论[M].第2版,北京:清华大学出版社,2010. 被引量:1
  • 3S Mangin, L Thomas, F Montaigne, et al. Angle depend- ence of the interface magnetic configuration in a model antiferromagnetically coupled ferrimagnetic/ferrimagnetic bilayer GdFe/TbFe[J].Phys. Rev. 13 , 2009,80 : 224424. 被引量:1
  • 4齐孝定.多铁性(multiferroic)材料的发展及潜在应用.物理双月刊,:461-461. 被引量:1
  • 5Polisetty S, Echtenkamp W, Jones K, et al. Piezoelect- ric tuning of exchange bias in a BaTiO3 /Co/CoO het- erostructure[J]. Phys. Rev. B , 2010,82 : 134419 . 被引量:1
  • 6Jung H Park, Jung-Hoon Lee, Min G Kim, et al. In- plane strain control of the magnetic remanence and cat- ion-charge redistribution in CoFe2 04 thin film grown on a piezoelectric substrate [ J ], Phys. Rev. B, 2010, 81 : 134401. 被引量:1
  • 7Sander D, Enders A, Kirschner J. Magnetization, mag- netostriction and film stress of Fe monolayers on W (100) [J]. IEEE Trans. Magn. , 1998,34:2015. 被引量:1
  • 8Vaz C A F, Bland J A C. Strain-induced magnetic ani- sotropy in Cu/Co/Ni/Cu/Si (001) epitaxial structures [J] .Phys. Rev. B, 2000, 61:3098. 被引量:1
  • 9Duc N H, Giang D T H, Chau N. Novel exchange- spring configuration for excellent magnetic and rnagne- tostrictive softness [J]. J. Magn. Magn. Mater. 2005, 290 - 291 : 800. 被引量:1
  • 10Lin W C, Wang B Y, Chen T Y ,et al. Enhanced ex- change bias coupling in Fe/FexMnl? x bilayer by re- ducing vertical lattice constants [J]. Appl. Phys. Lett. 2007,90..52502. 被引量:1

引证文献5

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部