摘要
采用Ｎ＋＋Ｃｒ＋多元离子束增强沉积合成（ＴｉＣｒ）Ｎ膜层，对膜层进行了ＡＥＳ、ＴＥＭ和ＸＲＤ分析．测试了膜基体系的力学性能和电化学性能．与普通物理气相沉积相比，多元离子束增强沉积显示了开发新型薄膜材料的较强潜力．
Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition.
出处
《原子核物理评论》
CAS
CSCD
1997年第3期173-176,共4页
Nuclear Physics Review
基金
北京市自然科学基金
